{"id":153,"count":7,"description":"
An error-free reticle (also known as a photomask or mask) represents a critical element in achieving high semiconductor device yields, since reticle defects or pattern placement errors can be replicated in many die on production waters. Reticles are built upon blanks: substrates of quartz deposited with absorber films. Íæż½ã½ã's portfolio of reticle inspection, metrology and data analytics systems leverage leading-edge optical and sensor technologies and Al-driven algorithms to help blank, reticle and IC manufacturers identify reticle defects and pattern placement errors, thereby reducing yield risk.<\/p>","link":"https:\/\/www.kla.com\/products\/reticle-manufacturing","name":"Reticle Manufacturing","slug":"reticle-manufacturing","taxonomy":"product_cat","parent":0,"meta":[],"acf":[],"yoast_head":"\n